http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110091863-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdaa64756184e715af6cb25ebc318917 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0198 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0154 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F41-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12M23-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2009-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c318bda365d9ed0373eea7083fb6fdf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55a7716c49d2c238fcc4073e731a2df0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9dca099229913b17d3009dcade18c808 |
| publicationDate | 2011-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20110091863-A |
| titleOfInvention | Magnetic patterning method and system |
| abstract | The present invention relates to a method and apparatus for patterning a substrate. The method includes providing at least one magnetic pattern generator (100b) configured and operable to adjust a magnetic field to induce magnetic properties that vary in accordance with a desired pattern to the magnetic field; Applying an adjusted magnetic field in the vicinity of the substrate 102 to form a specific pattern of regions of interaction obtained on top of the substrate; And under application of the adjusted magnetic field, the substrate interacting with the magnetic particles 106, wherein the magnetic particles are attracted to the regions of the selected interaction defined by the particular pattern, and outside the regions of the interaction. The regions of are not substantially attracted, thus forming a particular pattern of regions on top of the substrate that interact with the magnetic particles. The target pattern corresponds to a specific pattern, at a distance from the magnetic pattern generator where the sample is located, for a given magnetic field profile. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190127418-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130103282-A |
| priorityDate | 2008-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 65.