abstract |
A topcoat composition for photoresists comprising a fluorine-containing polymer having a repeating unit represented by the following General Formula (5) is disclosed. [Formula 31] In formula, R < 1> represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. n is 0 or 1, and m is an integer of 1- (3 + n). R 2 or R 3 represents a hydrogen atom or a protecting group. This topcoat composition has moderate developer solubility. |