| abstract |
The present invention provides a photoresist composition comprising a resin comprising a structural unit represented by formula (I) and a compound represented by formula (D '): In said formula, Q < 1> and Q < 2> represent a fluorine atom etc. independently, U represents a C1-C20 divalent hydrocarbon group, etc., X < 1> represents -O-CO- etc., A < +> represents an organic counter ion. Represent; Wherein R 51 , R 52 , R 53 and R 54 independently represent a C1-C20 alkyl group and the like, and A 11 is a C1-C36 saturated which may have one or more substituents and may contain one or more heteroatoms Cyclic hydrocarbon group. |