Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate |
2009-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0413dbcdc1e4cde12e814fca1e7efe3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b8afafd0f943e93866e15f5f8d7f889 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bc3ad76237cc5138bfe08758f27fea9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4445ca5d86e19df7d61dce3199573d81 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_685bbe5a9510f83733ff7aabf6615392 |
publicationDate |
2011-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20110079200-A |
titleOfInvention |
A resist underlayer film composition comprising an aromatic ring-containing polymer and ěš© for resist underlayer film |
abstract |
Provided is a resist underlayer film composition comprising an aromatic ring-containing polymer (VIII) and polymer for resist underlayer film. The aromatic ring-containing polymer contains a unit structure represented by the following formula (1).n n n [Formula 1]n n n n n n n n In Chemical Formula # 1, the definition of each substituent is as defined in the detailed description. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9529257-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014065500-A1 |
priorityDate |
2009-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |