| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2707056d594790a62947ee030653e6f8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
2009-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9e3040c83f10455e7506eb41cb4238f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2add04fb2e6517e34429748749718385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee6acfe547b6c127d95adbc9107af8b1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bc4f442f6e87db7a2412e3b6330158b |
| publicationDate |
2011-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110076464-A |
| titleOfInvention |
Negative liquid photoresist composition |
| abstract |
The present invention relates to a composition for negative type liquid photoresist, specifically, it can be applied to a continuous process (in-line) by imparting slipperiness property of the surface after coating and drying the liquid photoresist, It does not need a long time to stabilize the bubble has the advantage of preventing problems such as pin holes (pin hole) due to the bubble after coating. |
| priorityDate |
2009-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |