http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110046583-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2009-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20110046583-A |
| titleOfInvention | Resist processing method |
| abstract | An object of this invention is to provide the resist processing method which forms the pattern obtained by the resist composition for formation of the resist pattern of 1st time very finely and precisely in multi-patterning methods, such as the double patterning method. The present invention provides a resin (A), a photoacid generator (B), a crosslinking agent (C) and an acid growth agent (D) which have an acid labile group, are insoluble and poorly soluble in an aqueous alkali solution, and are soluble after working with an acid. Applying and drying a first resist composition comprising on a substrate to obtain a first resist film, prebaking, exposing, post-exposure baking, developing to obtain a first resist pattern, this is hard-baked And applying a second resist composition thereon to dry it to obtain a second resist film, preliminarily baking it, exposing it, baking it after exposure and developing it to obtain a second resist pattern. It is about. |
| priorityDate | 2008-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 228.