http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110044172-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2009-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f89ea907e1c9b69e680775bb47d4fd5 |
| publicationDate | 2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20110044172-A |
| titleOfInvention | Modification method of 1st film | membrane, and composition for acid transfer resin film formation used for this |
| abstract | SUMMARY OF THE INVENTION An object of the present invention is to provide a method for modifying a first film, wherein the first film is modified using a second film, and in particular, even if the first film to be a pattern does not contain an acid generator, the pattern can be applied using a conventional photolithography process. It is providing the modification method of the 1st film which can be formed, and the composition for acid transfer resin film formation used for this. That is, this modification method forms the 2nd film | membrane through the process (I) and mask 30 which form the 2nd film | membrane 20 containing an acid generator on the 1st film | membrane 10 which has an acid dissociative group, and the 2nd film | membrane ( 20) exposing 20) to generate acid, step (III) of transferring acid generated in second film 20 to first film 10, and removing second film 20 (IV) is provided in this order. |
| priorityDate | 2008-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 301.