http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110038721-A

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filingDate 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eae9c2705708f7d856c220031ecd5c51
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publicationDate 2011-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20110038721-A
titleOfInvention Graphene / SiC composite material production method and graphene / SiC composite material obtained by
abstract Provided the manufacturing method which can advantageously manufacture the graphene / SiC composite material in which the large-area graphene flat at the atomic level is laminated | stacked and formed on the SiC single crystal substrate. By removing the oxide film covering the surface of the SiC single crystal substrate formed by natural oxidation, the Si surface of the SiC single crystal substrate is exposed, and then, the SiC single crystal substrate on which the Si surface is exposed is heated in an oxygen atmosphere, thereby providing such a SiC single crystal. Graphene / SiC formed by stacking one or more layers of graphene on a SiC single crystal substrate by forming a SiO 2 layer on the surface of the substrate and heating the SiC single crystal substrate on which the SiO 2 layer was formed under vacuum. Composite materials were prepared.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8890171-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160132551-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190010287-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150075596-A
priorityDate 2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 31.