Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0aa485d286850898ac84bdb906bc1a41 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D13-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
filingDate |
2009-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fec44cb6142278f913a9e75a1c079099 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c1e3c5848f7219caeab79a012491da2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10ad34bad990aec3060476093a76de49 |
publicationDate |
2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20110033824-A |
titleOfInvention |
Method for manufacturing electrically insulating film and application to metalization reaction of Thruvia |
abstract |
The present invention is essentially directed to a method of forming an electrically insulating film on a substrate surface of an electrical conductor or semiconductor, such as a silicon substrate. According to the present invention, the method comprises: a) contacting the substrate surface with an aqueous solution comprising: - bipolar solvent; At least one diazonium salt; At least one monomer which is soluble and chain-polymerizable in said positive solvent; At least one acid which is in an amount sufficient to stabilize the diazonium salt by adjusting the pH of the solvent to a value lower than 7, preferably lower than 2.5; b) polarizing the surface according to a potentio- or galvano-pulsed mode for a period of time sufficient to form a film having a thickness of at least 80 nanometers, and preferably between 100 and 500 nanometers . |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140053912-A |
priorityDate |
2008-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |