| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318 |
| filingDate |
2010-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f18bbabc5671e620a67fbc1e94eb5e81 |
| publicationDate |
2011-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110029080-A |
| titleOfInvention |
Method of manufacturing semiconductor device and substrate processing apparatus |
| abstract |
Provided are a method for manufacturing a semiconductor device and a substrate processing apparatus capable of improving the film quality of a silicon nitride film. A silicon nitride film is formed on the substrate by alternately repeating a silicon-containing gas supply process for supplying a silicon-containing gas into a process chamber accommodated while the substrate is heated and an ammonia supply process for supplying a nitrogen-containing gas into the process chamber. And a film forming step, wherein the switching between the exhaust stop state and the exhaust operation state of the processing chamber is performed at least once or more during the ammonia supplying step to change the pressure in the processing chamber. to be. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9865458-B2 |
| priorityDate |
2009-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |