http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110025169-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
filingDate 2009-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46a0ab9bd0047a748aa9ee8858437ea6
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publicationDate 2011-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20110025169-A
titleOfInvention Cylindrical sputtering target and manufacturing method thereof
abstract The present invention provides a ceramic cylindrical sputtering target that significantly reduces the occurrence of cracking, dropping, abnormal discharge and nodule. The cavity formed by the ceramic cylindrical target material and the cylindrical base material is filled with a molten bonding material, cooling is started at one end in the cylindrical axis direction, cooled sequentially to the other end, and further bonded in the molten state during cooling. By supplying the cavity to the cavity, the total area of the portion where no bonding material is present in the X-ray transmission photograph of the bonding material is 10 cm 2 or less per 50 cm 2 of X-ray transmission photograph, and the maximum area of the portion where the bonding material does not exist is 9 cm 2 The ceramic cylindrical sputtering target characterized by the following is manufactured.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140057213-A
priorityDate 2008-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.