| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D139-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-066 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2009-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03e4a393f2aefc11b29e94f1106ed201
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cd98f094087b2421f9cf1d7d3d72914
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_756719e7bb57f56e9be2bb683cee6beb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fdc62489f26fc258f02e5dc830e9951 |
| publicationDate |
2011-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110018921-A |
| titleOfInvention |
Aqueous Compositions for Coating on Photoresist Patterns |
| abstract |
The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit having an alkylamino group, wherein the unit relates to an aqueous coating composition having the following structural formula (1): Where R 1 to R 5 are independently selected from hydrogen and C 1 to C 6 alkyl, and W is C 1 to C 6 alkyl. The invention also relates to a method of imaging a photoresist layer using the composition of the invention. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140090189-A |
| priorityDate |
2008-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |