http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110013363-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8412303829f82505584efd929e126dd0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cd23c354dd49d149991d5e4d2af08b17 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-916 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-676 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2009-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d98e381ce6edabd942fed7095956d082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_175e43a1eb01e2ff927fb7784e23a64c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3362b3844a8acc9cfa8402f7e5c9916 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efedf2ce17b2c8a887dc5e9e0ec63b2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4325b9f55ca562f3de8b2e7bc3c8031c |
| publicationDate | 2011-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20110013363-A |
| titleOfInvention | Photosensitive resin and photosensitive resin composition using the same |
| abstract | An object of the present invention is to provide a photosensitive resin which can be easily manufactured at low cost, easy to adjust the crosslinking density and acid value, and has excellent properties such as high heat resistance, high transparency, high refractive index and low linear expansion coefficient. The photosensitive resin is a carboxylic acid reactive (meth) acryl represented by the following general formula (2) to a high molecular compound obtained by reacting a compound having a fluorene skeleton represented by the following general formula (1) with a tetrabasic dianhydride. It is the photosensitive resin obtained by adding a rate compound. [Equation 1] (Ring Z 1 in the formula And ring Z 2 represents an aromatic hydrocarbon group, R 1a and R 1b represent a hydrogen atom or a substituent, R 2a and R 2b represent a substituent other than a hydrogen atom, R 3a and R 3b represent a hydrogen atom or a methyl group, k1 and k2 represent the same or different integers from 0 to 4, m1 and m2 represent the same or different integers from 0 to 3, n1 and n2 represent the same or different integers from 0 to 10 , p1 and p2 represent the same or different integers from 0 to 4) [Formula 2] (Wherein R 4 represents a hydrogen atom or a methyl group, and R 5 represents a group represented by the following general formula (5)): [Equation 5] (Wherein q, r and s each independently represent an integer of 0 to 9, except that q, r and s do not become 0 at the same time) |
| priorityDate | 2008-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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