| abstract |
In order to provide a positive photosensitive composition which is excellent in high heat resistance, high transparency, crack resistance, adhesion to a base, and is useful for the formation of a patterned film obtained by developing with an aqueous alkali solution, a silsesqui having a specific tetrafunctional functionality Provided is a positive photosensitive composition containing an oxane compound (A), a siloxane polymer (B), a 1,2-quinonediazide compound (C), and a solvent (D) by a plurality of kinds of alkoxysilane compounds having different alkoxyl groups. do. |