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publicationDate 2011-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20110002053-A
titleOfInvention Photomask Blanks, Photomasks and Photomask Blanks Manufacturing Method
abstract A photomask blank used to fabricate a photomask to which an ArF excimer laser light is applied, having a thin film of a multi-layer structure on a light transmissive substrate, the top layer of which is formed of at least one of chromium, nitrogen, oxygen, and carbon. It is a photomask blank which is an amorphous structure which consists of a material to contain.
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