| abstract |
It is an object of the present invention to provide a sputtering target having a uniform and smooth surface using a conductive inorganic oxide powder having a finer particle and good powder resistance as a raw material, as compared with conventional conductive inorganic oxide powders. In order to achieve this object, the conductive inorganic particles having an average primary particle size of 3 nm to 40 nm, which are doped with one or two or more components selected from aluminum, gallium, and indium in terms of oxides, are imparted with conductivity by 0.1w% to 20.0 wt%. An oxide powder is formed to be a sintered sputtering target. This electroconductive inorganic oxide powder is manufactured by the electrolytic doping method which electrolyzes in the state in which the inorganic oxide powder containing slurry whose average primary particle diameters are 1 nm-30 nm contained 1 type, or 2 or more types selected from aluminum, gallium, and indium. . |