http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100131728-A

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publicationDate 2010-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100131728-A
titleOfInvention Paste Composition with Etching and Doping Function
abstract a) a dopant material selected from at least one of lanthanide (LaB 6 ) powder, aluminum (Al) powder, metal bismuth (Bi) powder and bismuth oxide (Bi 2 O 3 ) powder; b) an organic binder; And c) a solvent, wherein the thin film is formed on one surface of the silicon wafer through a sintering process. And a paste composition having an etching and doping function, wherein the thin film is etched and simultaneously doped into the silicon wafer.n n n The paste composition according to the present invention uses a non-toxic paste instead of a fluorine compound or a phosphorus compound having high chemical reactivity, such as corrosiveness and toxicity, and does not undergo a cleaning process even after the doping process and the etching process because the non-toxic paste is used. There is an advantage that does not have to.
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