http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100127185-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 2010-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbf7f2561e66e4c479ede49c7b3d56f7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bffa4a732672dd927e60534c6ed14fee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be320ab77e8e1113b2306ca0a89a14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05f24d2638752f91da99fd428166da82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80ef552c51996da668b98c65da511d09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 |
publicationDate | 2010-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20100127185-A |
titleOfInvention | Resist modification composition and pattern formation method |
abstract | 1) A positive resist material comprising a polymer compound having a repeating unit having an alkali solubility and a polymer compound having a lactone structure-containing repeating unit under the action of an acid is formed on a substrate to form a first resist film, followed by exposure after heat treatment. And alkali developing after the heat treatment to form a first resist pattern, 2) Process of apply | coating resist modification composition on 1st resist pattern, heating, and performing a modification process, 3) Process of apply | coating a 2nd positive type resist material on it, exposing after heat processing, alkali developing after heat processing, and forming a 2nd resist pattern. It is a composition for resist modification used for the pattern formation method containing this, and contains the carbamate compound of following General formula (1) or (2), and a solvent. (Wherein m is an integer of 2 to 6, R 1 is H or an alkyl group, or R 1 may be bonded to each other to form a nitrogen-containing ring, R 2 is an alkyl group or an aryl group or an aralkyl group, and R 3 Is a methyl group or an ethyl group, A 1 is a hydrocarbon group which may include a hydroxyl group, an ether group, an amino group or a carbamate group) According to the present invention, a double patterning process is possible in which the substrate is processed by two exposures and one dry etching, while attaining sufficient inactivation of the first pattern and a good pattern shape after the second patterning. |
priorityDate | 2009-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 495.