| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3719
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-62 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 |
| filingDate |
2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de4a6d60991645fc02a94e6fb1745f68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f86af27a4247e71fd73e9605b852579b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca59db647a494c6edeae75be8041daa0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12196d284e283c534ccdeaead939ae0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef16d21e7626aa85abc4c05b68253676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aeb0d4ad6ffb45a801c21421c86b4399
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db37b19a45857e66ee8efa71409b129e |
| publicationDate |
2010-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100123757-A |
| titleOfInvention |
Wet cleaning compositions for non-selective oxide etching and methods of use |
| abstract |
The present invention relates to compositions and methods for removing undoped silicon-containing material from a microelectronic device at a higher or equivalent rate than removal of the doped silicon-containing material. |
| priorityDate |
2008-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |