http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100121469-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2009-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11147c4bacf2b61803909e1762156a7e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d95f310fac82139d0f11df4085218d9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_504141c248f62d92ab25a0465303e736 |
| publicationDate | 2010-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20100121469-A |
| titleOfInvention | Polishing composition and polishing method using same |
| abstract | The polishing composition according to the first aspect of the present invention contains a nitrogen-containing compound and polishing particles, and is a polishing composition having a pH of 1 to 7. The nitrogen-containing compound included in the polishing composition is represented by the general formula: R 1 -N (-R 2 ) -R 3 (However, R 1 , R 2 , R 3 each represent an alkyl group or a group in which a specific group is added to the alkyl group, two of R 1 to R 3 may form part of a heterocycle, and two of R 1 to R 3 Dogs have a structure represented by a common and remaining one, which may constitute part of the heterocycle), in addition to the carboxybetaine type amphoteric surfactant, sulfobetaine type amphoteric surfactant, imidazoline type amphoteric surfactant, and amine It may preferably include any one selected from the group consisting of oxide type amphoteric surfactants. The polishing composition according to the second aspect of the present invention contains a water-soluble polymer and polishing particles, contains no oxidizing agent, and is a polishing composition having a pH of 1 to 8. |
| priorityDate | 2008-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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