http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100121421-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2010-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d481c9cc995f3f31d77e718115fbdbc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e6307e60d0c272b42ff076047754791 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e31e7d5ec891992ee80b3706d7463ee8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01 |
| publicationDate | 2010-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20100121421-A |
| titleOfInvention | Radiation-sensitive resin composition for spacer formation, spacer, formation method of spacer, and liquid crystal display element |
| abstract | This invention provides the radiation sensitive resin composition for spacers which is highly sensitive and excellent in the adhesiveness after spacer formation. Moreover, this invention makes it a subject to provide the spacer excellent in adhesiveness with a board | substrate, its manufacturing method, and the liquid crystal display element provided with this spacer. In order to solve the said subject, the radiation sensitive resin for spacer formation containing resin (A) which has an acidic group, (B) polymerizable unsaturated compound, and (C) oxime ester compound represented by following General formula (1). To provide a composition. [In General Formula (1), R and B each independently represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.] |
| priorityDate | 2009-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 155.