| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21K2201-067 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21K1-062 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-72 |
| filingDate |
2009-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_477343d9fe80540680dbace6e9de6deb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1e5ae78074783fc5295a51926cc74ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bd72fcf638958b21ea98edb692a0245 |
| publicationDate |
2010-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100119770-A |
| titleOfInvention |
ELV optical member and its smoothing method |
| abstract |
The present invention is to provide a method for smoothing an optical surface having concave defects of an optical member for EUVL. The present invention is directed to an optical surface having a concave defect of an optical member for EUV lithography (EUVL) made of a TiO 2 -containing quartz glass material containing SiO 2 as a main component. It relates to a method for smoothing the optical surface of the optical member for EUVL, which comprises irradiating at from 2.0 J / cm 2. |
| priorityDate |
2008-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |