http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100112082-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2010-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53f65c507614cabacea00cff91415b1e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c8f68104b031dd43ae31efb337bb2f3 |
| publicationDate | 2010-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20100112082-A |
| titleOfInvention | Resin composition for film formation, the photosensitive resin composition, the manufacturing method of a resin pattern, and the resin pattern obtained by that, and an electronic device |
| abstract | (Problem) It is an object to provide a film-forming composition that is excellent in heat resistance, low dielectric constant, and stability over time of a film. (Solution means) A polymer compound containing a structural unit represented by the following general formula (1), wherein the structural unit has at least one fluorine atom and also has at least one acidic group or an acidic group protected by an acid-decomposable group in a molecule thereof. The resin composition for film formation containing these. In general formula (1), A represents the partial structure represented by general formula (2-1) or general formula (2-2). B represents a divalent organic group. X 1 and Y 1 represent a single bond or a divalent linking group. R 1 to R 12 represent a hydrogen atom, an alkyl group, a fluorine atom, or an acid group protected by an acid group or an acid-decomposable group, and at least one is a fluorine atom. |
| priorityDate | 2009-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 280.