| abstract |
The present invention provides a method of using a composition in a photolithography process, comprising applying a composition to a substrate to form a layer, and exposing at least a portion of the layer to DUV light, wherein the composition is dissolved in a solvent system. Or a dispersed polymer, the polymer comprising repeating monomers having the formula: In the formula, X in the rectangle and Y in the rectangle each independently represent an aryl or aliphatic group. |