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filingDate 2009-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1962992b0fbec65d19994c95e0698928
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publicationDate 2010-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100110807-A
titleOfInvention Method for producing group II-VI compound semiconductor, method for manufacturing group II-VI compound semiconductor phosphor and hexagonal group II-VI compound semiconductor
abstract The present invention provides a method for producing a high purity group II-VI compound semiconductor stably on an industrial scale, and a group II-VI compound semiconductor having a hexagonal structure with which metal doping and the like are easy. Also provided is a method for producing a II-VI compound semiconductor phosphor. According to the present invention, there is provided a method for producing a II-VI compound semiconductor by pulsed plasma discharge between metal electrodes in sulfur to produce a II-VI compound semiconductor, and a II-VI compound semiconductor phosphor using pulsed plasma discharge. The said subject is solved by the method and hexagonal II-VI compound semiconductor which has two or more twins.
priorityDate 2008-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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