| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2008-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f1bc73deb335da3a254262ee1090eb5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f2053be723a5329e3d7a9c3d3aa07f4 |
| publicationDate |
2010-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100088673-A |
| titleOfInvention |
Negative resist composition and pattern formation method using said negative resist composition |
| abstract |
An object of the present invention is to provide a negative resist composition capable of forming a pattern having a good shape with high sensitivity without reducing the resolution, and a pattern forming method using the negative resist composition. Negative, characterized in that it contains an acid generator (B) and a crosslinking agent (C) which generate an acid directly or indirectly by irradiating an active energy ray having a wavelength of 248 nm or less. The said subject was solved by the type | mold resist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170032221-A |
| priorityDate |
2007-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |