http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100080829-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8a9982b1666c54b5bf02d6c944891e4 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S5-3414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02664 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02546 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S5-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-205 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-34 |
| filingDate | 2008-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c211a07b6b2314e12dc64c77130d952 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_795b2b6ec5f054acc34347979e8b0289 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_573b7255ce59390929c2a9328056b52c |
| publicationDate | 2010-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20100080829-A |
| titleOfInvention | Quantum well mixing |
| abstract | Embodiments of the quantum well mixing (QWI) method include a wafer consisting of upper and lower epitaxial layers 10 and 13, each including a barrier layer, and at least disposed between the upper and lower epitaxial layers 10 and 13. Providing one quantum well layer 11; Stacking at least one sacrificial layer (21) on the upper epitaxial layer; And laminating a QWI reinforcement layer 31 on a portion of the sacrificial layer to form a QWI reinforcement region and a QWI suppression region, wherein a portion under the QWI reinforcement layer 31 is the QWI reinforcement region, and another The portion is the QWI suppression region. The method includes stacking a QWI suppression layer 41 on the QWI enhancement region and the QWI suppression region; And annealing at a temperature sufficient to cause interdiffusion of atoms between the quantum well layer 11 and the barrier layer of the upper and lower epitaxial layers 10 and 13. |
| priorityDate | 2007-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.