http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100078346-A

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publicationDate 2010-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100078346-A
titleOfInvention Substrate Processing Equipment
abstract The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to the present invention includes a chamber having a space formed therein for processing a substrate, a top lead coupled to the chamber to open and close the space portion of the chamber, and a sensor disposed within the chamber to measure the temperature of the chamber space. It is characterized in that it comprises a temperature sensor having a sieve, and a coating body surrounding the sensor body as a Teflon material having corrosion resistance.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013085341-A1
priorityDate 2008-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 29.