abstract |
The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to the present invention includes a chamber having a space formed therein for processing a substrate, a top lead coupled to the chamber to open and close the space portion of the chamber, and a sensor disposed within the chamber to measure the temperature of the chamber space. It is characterized in that it comprises a temperature sensor having a sieve, and a coating body surrounding the sensor body as a Teflon material having corrosion resistance. |