http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100073618-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4f1262bf89398faeaebaa19427cc573
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67126
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
filingDate 2008-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8f1bae0980fb4d5a3e9e3458eee8257
publicationDate 2010-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100073618-A
titleOfInvention SIO thin film heat treatment apparatus
abstract The present invention relates to a heat treatment apparatus for a SiOC thin film, wherein a substrate coated with a SiOC thin film is positioned in a cylindrical tube chamber, and a tray for performing heat treatment on the SiOC thin film, an O-ring installed to seal the left and right sides of the tube chamber, the A heater disposed to surround the outside of the tube chamber to apply heat to the SiOC thin film in the tube chamber, and a temperature controller that generates heat by the heater and controls the heat applied to the SiOC thin film to form an insulating film having a low dielectric constant. In addition, as the relative density of carbon increases by increasing the density of the thin film, the effect of increasing the film strength can be simultaneously obtained.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109287126-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109287126-B
priorityDate 2008-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.