| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-30 |
| filingDate |
2009-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4865151946cb04fd7ebc9519f67429f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_815eecbd95c27371f74fa181d4076e5d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e99259389c25f4d4883b80ab7f4c658 |
| publicationDate |
2010-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100070308-A |
| titleOfInvention |
Wet Cleaning Compositions for COOP and Porous Dielectrics |
| abstract |
The present invention relates to a formulation for wet cleaning removal of residues after etching and ashing from semiconductor substrates having CoWP properties, specifically deionized water; Organic acid; Amines and / or quaternary ammonium hydroxides, wherein the formulation is compatible with CoWP properties and (a) a molar ratio of amine and / or quaternary ammonium hydroxide to organic acid in the range of 7-14 Provide; (b) the formulation relates to a wet clean formulation comprising a corrosion inhibitor.n n n Methods of using the formulations have also been described. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170039575-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150069868-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10832917-B2 |
| priorityDate |
2008-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |