| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D317-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-22 |
| filingDate |
2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5d42751fa79325440240f984f272f1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17ba5588945955a4dc0d4dbeae15fc18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a339e9efe93656180c3c40f9cf084de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34a1b44bbadcde8964b69330ed82885d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f496c307a54555e97bc528a84e29eab |
| publicationDate |
2010-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100069195-A |
| titleOfInvention |
(Meth) acrylate compounds, photosensitive polymers and resist compositions |
| abstract |
It provides a (meth) acrylate compound, a photosensitive polymer, and a resist composition, wherein the (meth) acrylate compound has a structure of Formula 1 below.n n n [Formula 1]n n n n n n n n The definition of each substituent in Formula 1 is as described in the specification.n n n The (meth) acrylate compound according to an embodiment of the present invention can prepare an excellent resist composition that improves the adhesion properties to the underlying film quality and the line edge roughness on the pattern profile in the lithography process. have. |
| priorityDate |
2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |