http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100068366-A

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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a723b58e202ba1192ea677c00132054
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publicationDate 2010-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100068366-A
titleOfInvention Metal layer formation method, acoustic mirror structure formation method and acoustic mirror structure
abstract According to an exemplary embodiment, a method of forming a metal layer having reduced roughness includes forming a seed layer over a dielectric layer. The method further includes forming a metal layer over the seed layer. The seed layer causes the top surface of the metal layer to have a reduced thickness. The seed layer and the metal layer may be formed in the same process chamber or in different process chambers. Dielectric layers, seed layers and metal layers with reduced roughness may be used in the acoustic mirror structure.
priorityDate 2007-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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