| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-36 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D211-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D211-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D211-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D207-08 |
| filingDate |
2008-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe1a9bd7cc01429886e19401625d9874
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fa294ca9ed88c558da618de44e5786c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5d42751fa79325440240f984f272f1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f496c307a54555e97bc528a84e29eab |
| publicationDate |
2010-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100068083-A |
| titleOfInvention |
(Meth) acrylate compounds, photosensitive polymers, and resist compositions |
| abstract |
It provides a (meth) acrylate compound, a photosensitive polymer, and a resist composition, wherein the (meth) acrylate compound is a (meth) acrylate compound having a cyclo group containing nitrogen of the following formula (1).n n n [Formula 1]n n n n n n n n The definition of each substituent in Formula 1 is as described in the specification.n n n The photosensitive polymer including a (meth) acrylate compound having a cyclo group including nitrogen according to one embodiment of the present invention as a repeating unit is excellent in improving adhesion characteristics and pattern sidewall roughness to the underlying film in a lithography process. Resist compositions can be prepared. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022060116-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120082826-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022060091-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11016388-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210128920-A |
| priorityDate |
2008-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |