| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2008-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02934cac50cc9bbe1988c1cf760bff18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea324ab3d1b187b73c75e87e6cce7c0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74d7b3c6a1fecefda6cf4337323f748d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1454918d2fdd49189591db1afdc9d544 |
| publicationDate |
2010-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100067952-A |
| titleOfInvention |
CPM slurry with improved polishing selectivity and dispersion stability |
| abstract |
The present invention is water; Abrasive particles; At least one substance selected from the group consisting of a pyridine compound and a benzoic acid compound; And at least one nonionic compound selected from the group consisting of polyoxypropylene ether and polyoxyethylene oxypropylene copolymer.n n n According to the present invention, when a nonionic compound of polyoxypropylene ether and / or polyoxyethylene oxypropylene copolymer is added to a CMP slurry together with a pyridine compound and / or a benzoic acid compound, the polishing rate of the silicon oxide film is improved. In addition, it is possible to increase the polishing selectivity between the silicon oxide film and the silicon nitride film, and solve the problem of filter clogging and loss of abrasive solids in the filtering process for removing impurities. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109251677-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015528036-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021131434-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109251677-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101406759-B1 |
| priorityDate |
2008-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |