| abstract |
The present invention provides a sulfonium salt represented by the formula (1).n n n <Formula 1>n n n n n n n n (Wherein, R 1 is the one which may contain a hetero atom represents a hydrocarbon group, R 1 is the case of a vinyl group and isopropenyl group, except, R 2, R 3 and R 4 are an alkyl group, an alkenyl group, or oxo An alkyl group, or an aryl group, an aralkyl group or an aryloxoalkyl group, or any two or more of R 2 , R 3 and R 4 may combine with each other to form a ring together with a sulfur atom in the formula, n is 1 To an integer of 3).n n n The chemically amplified resist material of the present invention has excellent focus margin, less line width fluctuation and shape deterioration even when PED is extended for a long time, excellent pattern profile shape after development, and high resolution suitable for fine processing. |