| abstract |
The present invention has a skeleton derived from (A) a polymer compound having a repeating unit represented by the formula (1), (B) a lactone ring and / or a hydroxyl group and / or maleic anhydride, and is soluble in an alkaline developer by the action of an acid. The resist material containing the polymeric compound which becomes this, the compound which generate | occur | produces an acid by exposure of high energy ray, and (D) organic solvent is provided.n n n n n n n n Wherein R 1 is H, a methyl group or a trifluoromethyl group, R 2a and R 2b are H or an alkyl group, and R 2a and R 2b may be bonded to each other to form a ring together with the carbon atom to which they are bonded , R 3 is a single bond or an alkylene group, R 4 is an alkyl group or a fluorinated alkyl group, and may include -O- or -C (= O)-.)n n n The resist material of the present invention has excellent transparency to radiation having a wavelength of 200 nm or less, and can be adjusted from various materials in immersion lithography by selection of the resin structure, and can be manufactured from raw materials that are easy to obtain and handle. Do. |