| abstract |
The present invention provides a fluorine-containing monomer having a cyclic acetal structure represented by the formula (1).n n n n n n n n (R is a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, in which a part of a hydrogen atom may be substituted with a halogen atom, and a part of a methylene group may be substituted with an oxygen atom or a carbonyl group, and Z is an alkyl bonded at both ends. Bivalent organic groups which form a five-membered ring or a six-membered ring together with a lenoxy group and include a polymerizable unsaturated group)n n n The present invention provides a novel fluorine-containing monomer having a cyclic acetal structure useful as a raw material for a photofunctional material, a coating material and the like. Among them, the polymer using the monomer has excellent transparency to radiation having a wavelength of 200 nm or less, and also has excellent water repellency and can adjust various performances such as water repellency, fat soluble, acid decomposability, and hydrolysis according to the structure selection. Do.n n n Fluorine-containing monomer, high molecular compound, resist protective film material, resist material |