Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-30 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 |
filingDate |
2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a2e696b9aa42b7534ebfec97388f2a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec514b3febe92155b79f28e199fdf910 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f349641abe26cc591615b4e29cb3f267 |
publicationDate |
2010-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20100048144-A |
titleOfInvention |
Metal film etching solution composition |
abstract |
The present invention is 0.5 to 15% by weight of hydrogen peroxide relative to the total weight of the composition; Nitrate 1-15 wt%; 0.05-10% by weight of organic acid, inorganic acid or mixtures thereof; 0.1 to 10 weight percent organic acid salt; And a single film of AZO or silver (Ag) containing a residual amount of water, or an etching solution composition for a double film or a triple film composed thereof. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11384437-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160115189-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180133139-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150108103-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190000428-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9477358-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170131947-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10723946-B2 |
priorityDate |
2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |