| abstract |
It is used in manufacturing processes, such as a semiconductor device which has metal wiring containing copper, and an anticorrosive component is a pyrazole derivative, a pyrazole derivative like 3, 5- dimethyl pyrazole, and a triazole like 1,2,4-triazole. A derivative, aminocarboxylic acids, such as imino diacetic acid, ethylenediamine dipropionate hydrochloride, and disulfide compounds, such as diisopropyl disulfide and diethyl disulfide, The detergent component is ammonium fluoride, tetramethylammonium fluoride, acetic acid It is a composition for cleaning anticorrosion which is any one of ammonium, acetic acid, glyoxylic acid, oxalic acid, ascorbic acid, 1,2-diaminopropane and dimethylacetamide. Moreover, it is a manufacturing method, such as a semiconductor element using the composition for cleaning systems. |