http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100044700-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_52a65b677bbedbe7bf090dd556a7cc43 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-1055 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0381 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
filingDate | 2009-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82b19179a03cecf0015e71c98a2cb19e |
publicationDate | 2010-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20100044700-A |
titleOfInvention | Display element which has positive photosensitive composition, cured film obtained from this composition, and this cured film |
abstract | Radical polymer of the monomer containing the radically polymerizable monomer (a-1) which is a linear siloxane structure and the radically polymerizable functional group of the number of silicon 3 or more, and the vinyl ketone which has a phenolic hydroxyl group. A positive type photosensitive composition containing (A) and a 1,2-quinonediazide compound (B), which may contain an alkali-soluble polymer (C), is formed, and a cured film is formed from this photosensitive composition to obtain liquid repellency. An excellent cured film is obtained and this cured film is used for the film in a display element. |
priorityDate | 2008-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 223.