http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100042815-A

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filingDate 2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1a9e4dca04d1665f6c1acbbaa8134cc
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publicationDate 2010-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100042815-A
titleOfInvention Nanopatterning Method of Polymer Thin Films through Topographic Prepattern and Controlled Dewetting and Polymer Thin Films Prepared therefrom
abstract The present invention is spin-coated a polymer solution in a pre-pattern, and then subjected to heat treatment to dewetting only within a predetermined pattern region of the prepattern, whereby nano-patterning is performed. One of the non-lithographic methods that can produce polymer thin films of oriented nanostructures.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10074544-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015303064-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014176211-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018053800-A1
priorityDate 2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.