Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f0e688f4f0f360c3093469970677fdbe |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1a9e4dca04d1665f6c1acbbaa8134cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f8d485d1b9d0412db0994ebff613216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29f58063989aa79fc840641a2140112c |
publicationDate |
2010-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20100042815-A |
titleOfInvention |
Nanopatterning Method of Polymer Thin Films through Topographic Prepattern and Controlled Dewetting and Polymer Thin Films Prepared therefrom |
abstract |
The present invention is spin-coated a polymer solution in a pre-pattern, and then subjected to heat treatment to dewetting only within a predetermined pattern region of the prepattern, whereby nano-patterning is performed. One of the non-lithographic methods that can produce polymer thin films of oriented nanostructures. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10074544-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015303064-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014176211-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018053800-A1 |
priorityDate |
2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |