http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100041644-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2008-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20c32358d6f8f1f2510c0836bc1bce32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eb63849aeb6f04608ad8884cc8a6f4a |
| publicationDate | 2010-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20100041644-A |
| titleOfInvention | High injection volume strips (HDS) method and apparatus by chemical reaction with hydrogen |
| abstract | The plasma is generated using a hydrogen element, a weak oxidant, and a fluorine containing gas. An inert gas is inserted into the plasma downstream of the plasma source and upstream of the shower head, wherein the shower head directs the gas mixture into the reaction chamber, where the mixture reacts with the high-injection injection photoresist. The treatment removes both the sheath and the bulk resist layer at a high strip rate and allows the workpiece surface to remove residue with minimal silicon loss. |
| priorityDate | 2008-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.