http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100033603-A

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filingDate 2008-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03453301032ebb96be30ee1bdcf2ba38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89233a3813d6b26fc639044d91bdd990
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publicationDate 2010-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100033603-A
titleOfInvention Developable Superhydrophobic Photosensitive Compositions
abstract The present invention provides a super-hydrophobic photosensitive resin composition suitable as a partition wall for forming pixels in an LCD cell in an LCD manufacturing process using an inkjet process.n n n The present invention is extremely hydrophobic, the contact angle with distilled water is> 90 °, the contact angle with ethyl cellosolve is> 35 °, and has a sufficient solubility in the developer before and after exposure to realize micropatterns up to 10 µm or less. It is to provide negative photosensitive developable super hydrophobic materials for such transparent inkjets.n n n Epoxy group or methacrylate group, which reacts by heat or light to a reactive site to a copolymer of a C4 to C30 saturated or unsaturated fluorine-substituted carbon hydrogen group and a saturated or unsaturated hydrocarbon group to provide superhydrophobicity. Resin composition comprising a resin component adopting a unit having a reactive group such as an acrylate group and a unit having a carboxylic acid group to enable development after exposure and a polyfunctional (meth) acrylate using UV curing and a thermosetting reaction by a photoinitiator. To manufacture LCD pixel bulkheads.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101539809-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140007340-A
priorityDate 2008-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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