http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100029626-A

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-08
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filingDate 2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b94cecb3d583bc61cea11f39aa77c15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37b18b77f56420f7ad00c31857b9dc8d
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publicationDate 2010-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100029626-A
titleOfInvention Substrate Surface Treatment Apparatus and Method Using Trimethylchlorosilane Vapor
abstract The present invention relates to a device and a method for changing the surface characteristics of a substrate using a trimethylclorosilane (TMCS) vapor in a semiconductor manufacturing process or a display device manufacturing process, and in particular, the substrate and TMCS in a container that can control the degree of vacuum Install a small container that can hold, place a TMCS drop in the container, and use TMCS vapor to change the surface of the substrate to the desired surface energy state by varying the pressure, temperature and processing time inside the container. Provided are a substrate surface treatment apparatus and a substrate surface treatment method using TMCS vapor.
priorityDate 2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.