| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dd7c27b9ec61781656e6f039702fd568 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate |
2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_807518a0b5e9443b46fbd57c85996fc0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ae56d6c196e83f6e1fb241ce5d69733
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51a98b6184876627a37714fedd9b2264
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f7250b2336a610ae2c7ae929dcd51b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d04eac130f66314eaa4efdf192e03eff |
| publicationDate |
2010-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100025870-A |
| titleOfInvention |
Process for preparing copper thin film by atomic layer deposition using copper aminoalkoxide precursor |
| abstract |
The present invention relates to a method for producing a copper thin film by atomic layer deposition (ALD) using a copper aminoalkoxide precursor as a raw material of copper, to obtain a high quality copper oxide thin film under milder process conditions. Can be. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10287681-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101124226-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015099452-A1 |
| priorityDate |
2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |