| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F228-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F28-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2009-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af2df146e3c8c403a827b3e958b36cf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0b9fdcd02896bed15c330df43dce53d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abe0bf00aaca69b71750dd5e9834ce5d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a |
| publicationDate |
2010-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100023748-A |
| titleOfInvention |
Positive resist composition, resist pattern formation method, high molecular compound |
| abstract |
As a positive type resist composition containing the base component (A) which the solubility to alkaline developing solution increases by the action of an acid, and the acid generator component (B) which generate | occur | produces an acid by exposure, the said base component (A) is The structural unit (a0) represented by the following general formula (a0-1) [R 2 is a divalent linking group, R 3 is a cyclic group containing -SO 2 -in its ring skeleton.], And an acid dissociable, dissolution inhibiting group A positive resist composition comprising a high molecular compound (A1) having a structural unit (a1) derived from an acrylate ester to be contained.n n n [Formula 1] |
| priorityDate |
2008-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |