http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100023215-A

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filingDate 2008-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100023215-A
titleOfInvention Ultrafine pattern formation method using organometallic solution
abstract An ultrafine pattern formation method using an organometallic solution is provided. The ultrafine pattern forming method includes forming a transfer layer on a substrate. The organometallic solution forming the transfer layer contains a metal complex compound obtained by reacting a metal or a metal compound with an ammonium compound. The transfer layer is pressed using a stamp having a pattern having an uneven structure and the substrate having the transfer layer is heated to form a conductive pattern having a pattern corresponding to the recess of the stamp.
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