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filingDate 2010-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9c9452b4b85e41cee07ba9b014fbe2b
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publicationDate 2010-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100020501-A
titleOfInvention Low dielectric plasma polymer thin film and method for manufacturing same
abstract TECHNICAL FIELD The present invention relates to a low dielectric plasma polymer thin film and a method of manufacturing the same, and more particularly, to a low dielectric plasma polymer thin film and plasma enhanced chemical vapor deposition (PECVD) deposition and RTA prepared using a linear or organic precursor material. It relates to a method for producing the low dielectric plasma polymer thin film through a post heat treatment using an apparatus. The low dielectric plasma polymer thin film according to the present invention is thermally very stable and has a low dielectric constant and is formed in a thin film structure having excellent mechanical properties, which is effective in producing a metal multilayer thin film.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9371430-B2
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