http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100009580-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2008-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9bd142784285954564fbd5330cba6d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3a0a538b98c555f45ce7416642b545c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_178e94dab545bde591bc54583473f4c2 |
| publicationDate | 2010-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20100009580-A |
| titleOfInvention | A composition for forming an antireflection film, and a resist pattern forming method using the same |
| abstract | The present invention provides a composition for forming an antireflection film having a predetermined pH, wherein the composition for forming an antireflection film capable of forming an antireflection film having sufficient optical properties excellent in storage stability, matching with a resist film and coating property is provided. It is about.n n n A composition for forming an antireflection film for forming an antireflection film provided on a resist film, the composition for forming an antireflection film containing a water-soluble film formation component and a predetermined fluorine compound is provided. By adding a predetermined fluorine compound, this antireflection film formation composition can easily adjust pH without reducing applicability, and can provide the composition for antireflection film formation excellent in storage stability and matching property with a resist film. Moreover, since the said fluorine compound contributes also to the improvement of the optical characteristic of an antireflection film, it can also provide the composition for antireflection film formation which can form the antireflection film which has the outstanding optical characteristic. |
| priorityDate | 2007-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 106.