| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D303-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C37-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 |
| filingDate |
2008-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dd0670d2727214f49230d0aba6cf131
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e703dda1de79ceb6196d49013b35883
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1961c495d9f5c3e05edfbad190bf47d7 |
| publicationDate |
2010-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100009110-A |
| titleOfInvention |
Reactive monomer for polyimide precursor and negative photosensitive polyimide precursor using the same |
| abstract |
The present invention relates to a reactive monomer for a polyimide precursor and a negative photosensitive polyimide precursor using the same, and more particularly, to a reactive monomer for a polyimide precursor including an acrylic group and an epoxy group and a negative photosensitive polyimide precursor using the same.n n n According to the present invention, a highly sensitive negative photosensitive polyimide precursor can be easily prepared using the reactive monomer.n n n n Negative photosensitive, polyimide precursor, reactive monomer |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113880716-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101273140-B1 |
| priorityDate |
2008-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |